- OYAMA, Japan|반도체/부품
Company demonstrates that magnetic-field debris mitigation, a new technology, extends collector mirror lifetime in Pilot light source for EUV lithography mass production plants, a major step towards eliminating bottlenecks
OYAMA, JAPAN--(Business Wire / Korea Newswire) February 24, 2017 -- Gigaphoton Inc., a leading manufacturer of light sources used in lithography, has announced that in the field of Laser-Produced Plasma (LPP) light sources for EUV scanners, which the company is currently engaged in developing, it has successfully demonstrated that debris mitigation using magnetic fields, the company‘s new proprietary technology, is effective in extending the lifetime of collector mirrors in pilot light sources1) designed to operate in state-of-the-art semiconductor mass production lines, which have been a result of Japan’s National Institute for New Energy and Industrial Technology Development (NEDO) grant program.
EUV light source equipment concentrates light generated by high-intensity EUV plasma, and requires collector mirrors to then transmit this light to lithography equipment. However, when operating at high output rates the mirrors soon become contaminated with the tin being targeted by the mirror's light, which leads to exceedingly short lifespans of collector mirrors. This challenge has been a major barrier for their practical application.
In its experiments, Gigaphoton has verified that its patented technology, which uses magnetic fields to mitigate debris, extends the lifetime of collector mirrors (with a reflectance decrease of less than 0.5% per billion pulses). These experiments involved the magnetic-field debris mitigation technology installed onto an EUV lithography pilot light source equivalent to one typically used in a mass production plant, and then operated at 100 W. The data suggests that the lifespan of collector mirrors, which was previously only a few weeks under continuous operation, can be successfully extended.
Hakaru Mizoguchi, Vice President & CTO of Gigaphoton says, “This demonstration of the effectiveness of our magnetic-field debris mitigation technology for pilot light sources designed to operate in state-of-the-art semiconductor mass production lines, shows how incredibly close we are to overcoming major technological bottlenecks and introducing the technology into the EUV light source market. We remain committed in our efforts to support overall development in the semiconductor industry and contribute to the realization of an IoT based society through the development of EUV light sources.”
1): a light source designed by Gigaphoton for use in mass production plants that use EUV lithography. Also called a “high output demonstration unit”
More information on this issue will be announced at the upcoming international symposium on advanced lithography, “SPIE Advanced Lithography 2017,” to be held from February 26 to March 2 in San Jose, California.
Since it was founded in 2000, Gigaphoton has delivered valuable solutions to semiconductor manufacturers throughout the world as a laser supplier. Gigaphoton's patented and innovative technology of LPP EUV solutions play a leading role in achieving better cost effectiveness and productivity in EUV scanners intended for high-volume manufacturing. In every stage from R&D to manufacture, sales, and maintenance services, Gigaphoton is committed to providing world-class support delivered from the perspective of everyday users. For more information please visit www.Gigaphoton.com.
The information contained in this news release is current at the time of announcement and subject to change without notice.
The original source-language text of this announcement is the official, authoritative version. Translations are provided as an accommodation only, and should be cross-referenced with the source-language text, which is the only version of the text intended to have legal effect.
View source version on businesswire.com: http://www.businesswire.com/news/home/20170223005590/en
Corporate Planning Department