Gigaphoton Succeeds in Extending the Lifetime of Collector Mirrors in EUV Pilot Light Sources with Its Patented Technology “Magnetic-Field Debris Mitigation”
Company demonstrates that magnetic-field debris mitigation, a new technology, extends collector mirror lifetime in Pilot light source for EUV lithography mass production plants, a major step towards eliminating bottlenecks
EUV light source equipment concentrates light generated by high-intensity EUV plasma, and requires collector mirrors to then transmit this light to lithography equipment. However, when operating at high output rates the mirrors soon become contaminated with the tin being targeted by the mirror's light, which leads to exceedingly short lifespans of collector mirrors. This challenge has been a major barrier for their practical application.
In its experiments, Gigaphoton has verified that its patented technology, which uses magnetic fields to mitigate debris, extends the lifetime of collector mirrors (with a reflectance decrease of less than 0.5% per billion pulses). These experiments involved the magnetic-field debris mitigation technology installed onto an EUV lithography pilot light source equivalent to one typically used in a mass production plant, and then operated at 100 W. The data suggests that the lifespan of collector mirrors, which was previously only a few weeks under continuous operation, can be successfully extended.
Hakaru Mizoguchi, Vice President & CTO of Gigaphoton says, “This demonstration of the effectiveness of our magnetic-field debris mitigation technology for pilot light sources designed to operate in state-of-the-art semiconductor mass production lines, shows how incredibly close we are to overcoming major technological bottlenecks and introducing the technology into the EUV light source market. We remain committed in our efforts to support overall development in the semiconductor industry and contribute to the realization of an IoT based society through the development of EUV light sources.”
1): a light source designed by Gigaphoton for use in mass production plants that use EUV lithography. Also called a “high output demonstration unit”
More information on this issue will be announced at the upcoming international symposium on advanced lithography, “SPIE Advanced Lithography 2017,” to be held from February 26 to March 2 in San Jose, California.
http://spie.org/conferences-and-exhibitions/advanced-lithography
About Gigaphoton
Since it was founded in 2000, Gigaphoton has delivered valuable solutions to semiconductor manufacturers throughout the world as a laser supplier. Gigaphoton's patented and innovative technology of LPP EUV solutions play a leading role in achieving better cost effectiveness and productivity in EUV scanners intended for high-volume manufacturing. In every stage from R&D to manufacture, sales, and maintenance services, Gigaphoton is committed to providing world-class support delivered from the perspective of everyday users. For more information please visit www.Gigaphoton.com.
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View source version on businesswire.com: http://www.businesswire.com/news/home/20170223005590/en
Website: http://www.gigaphoton.com/?lang=en
Contact
Gigaphoton Inc.
Corporate Planning Department
Akinori Matsui
+81-285-37-6931
web_info@gigaphoton.com
This news is a press release provided by Gigaphoton Inc.. Korea Newswire follows these editorial guidelines.
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2023년 3월 24일 18:08
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2023년 3월 24일 18:03