Gigaphoton Achieves a Decrease in Collector Mirror Reflectance of -0.4 % / Bpls for EUV Pilot Light Sources

News provided by Gigaphoton Inc.
September 12, 2017 10:00

OYAMA, JAPAN--(Business Wire / Korea Newswire) September 12, 2017 -- Gigaphoton Inc., a leading manufacturer of light sources used in semiconductor lithography, announced with regard to their current development of Laser-Produced Plasma (LPP) light sources for EUV scanners, that a decrease in collector mirror reflectance of -0.4 % / Bpls has been achieved for their pilot light sources. Note) These sources are expected to operate in leading-edge semiconductor mass-production lines and this marks a major step forward in the resolution of bottlenecks.

This summer, through optimizing hydrogen flow and improving its proprietary technology for the removal of debris using magnetic fields, Gigaphoton measured a decrease in reflectance of -0.4% / Bpls when performing lifetime tests on pilot light sources equipped with actual collector mirrors.

This corresponds to mirror lifetime of 3 months and, comparing with the same tests conducted in April (decrease in reflectance -10% / Bpls), represents a major advancement.

Gigaphoton Vice President, Hakaru Mizoguchi commented, “These results for the pilot light sources that are expected to operate in leading-edge semiconductor mass-production lines show that, with a major technological bottleneck resolved, the introduction of EUV light sources into the market is now drawing much closer. We hope to continue to contribute to the growth of the semiconductor industry through our development of EUV light sources.”

This achievement is scheduled to be reported at “SPIE Photomask Technology ± with EUV Lithography” to be held in Monterey, California 9/11 - 9/14.

Note) Light source designed by Gigaphoton for use in EUV lithography mass-production factories. Also called high output demonstration equipment.

*This work accesses the experimental results of a subsidy program under New Energy and Industrial Technology Development Organization (NEDO).

About Gigaphoton

Since it was founded in 2000, Gigaphoton has delivered valuable solutions to semiconductor manufacturers throughout the world as a light source supplier. Gigaphoton's patented and innovative technology of LPP EUV solutions play a leading role in achieving better cost effectiveness and productivity in EUV scanners intended for high-volume manufacturing. In every stage from R&D to manufacture, sales, and maintenance services, Gigaphoton is committed to providing world-class support delivered from the perspective of everyday users. For more information please visit Welcome to Gigaphoton.

The information contained in this press release was correct at the time of publication, and may change without prior notice.

View source version on



Gigaphoton Inc.
Corporate Planning Division
Katsutomo Terashima

This is a news release distributed by Korea Newswire on behalf of this company . Learn more